Solution
BISTel’s Equipment Engineering System (EES) solution suite includes a wide range of real-time monitoring and control applications to provide
• Transformation of large data into actionable manufacturing intelligence
• Connectivity between equipment, process and engineers to drive productivity higher
• Assurance of high yields by guarding against yield impacting events
* Process Equipment
Cluster tools, In-line tools, measurement tools, etc.
* External Systems
Manufacturing Execution Systems, Material Control Systems, Defect analysis, Yield analysis, etc.
Real-time Monitoring Solutions
eFDC
eFDC monitors equipment data and identify faults in real-time to maximize production and reduce scrap
– Centralized data collection plan capable of collecting data from different sources
– Data quality index available to help reduce false alarms
– Supports both single variable and multivariatre analysis
– Graphical equipment Fingerprinting for performance comparison of equipment
– Interdiction manager for the intire EES platform
– Real-time SMS/email notification of detected issues
– Advanced data archiving and summary reporting
Real-time Monitoring Solutions
eSPC
eSPC provides a powerful tool in detecting process anomalies to help improve product yield
– 60+ SPC rules available, including SEMI Standard SPC rules
– Auto creation and tuning of model
i.e.: models can automatically adapt to drifting parameters
– SPC model simulation against the history data
– OCAP capabilities include Alarm, LOT Hold, EQP Hold, etc.
– Intuitive charting to simplify analysis
Optimization and Control Solutions
eR2R
eR2R calculates and adjusts recipe values to ensure stable process control and high yield
– Graphical workflow designer for R2R modeling
– Rich library of workflow function enabling advanced modeling creation
– Models can be uploaded to system while in operation
– Models can be easily shared to allow quick deployment fab-wide
Optimization and Control Solutions
eMPA
eMPA improves factory productivity and OEE to maximize ROI
– Intelligently tracks equipment performance to identify time loss during production
– Analysis and interdiction for substrate trace time
– Effective in all production models regardless of tool types
– Compliant with all SEMI standards, including E10-RAM, E58-ARAMS, E79-OEE, and E116-EPTI
Maintenance and Management Solutions
eRMS
eRMS effectively manages process recipes and minimizes operation errors
– Validation of active recipes including parameter set values, equipment constants, recipe sequence, etc
– Fab-wide recipe management allowing centralized control and fab-centric integration
– Parameter-based recipe control
– Compliant to SEMI E42 standard
Maintenance and Management Solutions
ePPM
ePPM reduces downtime and costs with effective preventative management
– Parts inventory and utilization management
– Seamless integration with MES and ERP systems allowing automatic job creation and PM scheduling
– Condition-based maintenance work order can be generated by FDC alarms
– Extensive reporting capabilities on equipment maintenance and operation history
